Air New Zealand Fashion Week special
Lucire’s ‘Luxe’ issue showcases new talent, features
Air New Zealand Fashion Week special
Wellington, November 27 (JY&A Media) Lucire, New Zealand's global fashion title, will publish its second print number on Monday, November 29, featuring Air New Zealand Fashion Week exclusive reports, and the talents of photographers Janet Liu and Douglas Rimington, make-up artist Jessica Tarazi and fashion designer Brad Batory of Indashio.
‘Ever since we
launched in 1997 as a web title, we have been proud to
launch the careers of many fashion designers,’ said
publisher Jack Yan. ‘We’re hopeful that we can help those
within our team.’
Ms Liu of Vision 8 Photography
in Wellington travelled to Auckland for Air New Zealand
Fashion Week and shot every garment that came down the
catwalk. While a fashion photography veteran in her native
China, Lucire exclusively showcases work from her first
major New Zealand catwalk event.
Mr Rimington was
an unknown photographer with an interest in fashion. In the
November issue of Lucire, he worked on various product
shots. December sees Mr Rimington expand his repertoire to
events, and Mr Yan expects to see shoots helmed by the Lower
Hutt-based photographer in 2005.
Ms Tarazi is an
international make-up artist based primarily in New York
(see
http://www.jessicatarazi.com). She made-up Denise Vasi
on Lucire’s first national print cover. Her work appears on
the next Lucire cover as well, including a major shoot
photographed by Frank Forgione on Coney Island inside the
magazine.
Ms Tarazi features in a major April 2005
story in Lucire on the life of a make-up artist.
The
Coney Island shoot was styled by Brad Batory of Indashio
(www.indashio.com), who was first featured in Lucire in
2003.
Mr Batory, a young designer originally from
Dunedin, Florida, moved to New York and counts singer Eve
and some MTV VJs as his clients. He has used garments from
his own range and those of Anat Ishai and Noa Polansky.
Other shoots in the magazine have been styled by
Auckland stylist and art director Russell McConnell.
Lucire’s December number also débuts the work of fashion
columnist John Satre, reporting on global trends and behind
the scenes at Air New Zealand Fashion Week.
Lucire
features’ editor Phillip D. Johnson reviews New York Fashion
Week in depth and provides cocktail recipes for the
holidays.
The magazine features interviews with two
notable New Zealanders: Her Business's Fiona Powell and
Pleasure State's Kay Cohen.
Many Lucire regulars
round off the contributors in this issue: Richard Spiegel,
Stevie Wilson, Nicola Brockie, Jack Yan, Amanda Dorcil,
Catherine Rigod, Cheryl Gorski and Susan Kelly.
The magazine goes on sale nationally in New Zealand on
Monday, November 29, at NZ$9•45. Lucire is now also sold at
selected outlets in Australia at A$8•95. The next issue hits
Australian newsstands in Melbourne and Sydney in December.
Lucire has published since 1997, initially on the
web. It was the first fashion magazine to make the leap from
web to print.
About Lucire
Lucire, the global
fashion magazine, is one of the world’s leading fashion
titles online. Founded in 1997, it covers fashion, beauty,
travel and lifestyle, with a global perspective for today’s
woman. It is known for providing in-depth, quality
journalism. The magazine is targeted at the woman who is
tired of the offerings from established fashion players, and
chooses to be herself. Lucire is available at http://www.lucire.com.
In 2003, Lucire received a Webby Award
nomination—the only New Zealand site to do so that year—and
became the first fashion industry partner of the United
Nations Environment Programme (UNEP, http://www.unep.org).
It
was Official Internet Partner of L’Oréal New Zealand Fashion
Week for 2002–3, and a media sponsor of the inaugural San
Francisco Fashion Week and Official Media Partner of
Stockholm FashionDays for 2004–5. A print edition launched
in the New Zealand market in October 2004.
According
to Alexa, Lucire is one of the top-ranked pure-play fashion
titles in the world.
Note to editors
Lucire is a
registered trademark of Jack Yan & Associates and subject to
protection in certain jurisdictions. All other trademarks
are the properties of their respective owners and are only
used in a descriptive fashion without any intention to
infringe.